Spacer etch process for self-aligned bouble patterning of 32nm half-pitch

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Authors
Altamirano Sanchez, Efrain; Vandeweyer, Tom; Dekkers, Harold; Vangoidsenhoven, Diziana; Boullart, Werner
Conference
2nd International PESM Workshop on Plasma Etch and Strip in Microelectronics - PESM
Title
Spacer etch process for self-aligned bouble patterning of 32nm half-pitch
Publication type
Meeting abstract
Embargo date
9999-12-31
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