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Enhanced resolution of poly(methyl methacrylate) electron resist by thermal processing

dc.contributor.authorArjmandi, Nima
dc.contributor.authorLagae, Liesbet
dc.contributor.authorBorghs, Gustaaf
dc.date.accessioned2021-10-17T21:18:02Z
dc.date.available2021-10-17T21:18:02Z
dc.date.issued2009
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14905
dc.sourceIIOimport
dc.titleEnhanced resolution of poly(methyl methacrylate) electron resist by thermal processing
dc.typeJournal article
dc.contributor.imecauthorLagae, Liesbet
dc.contributor.imecauthorBorghs, Gustaaf
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1915
dc.source.endpage1918
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue4
dc.source.volume27
dc.identifier.urlhttp://scitation.aip.org/jvstb/
imec.availabilityPublished - open access


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