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Articles
Enhanced resolution of poly(methyl methacrylate) electron resist by thermal processing
Publication:
Enhanced resolution of poly(methyl methacrylate) electron resist by thermal processing
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Date
2009
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Arjmandi, Nima
;
Lagae, Liesbet
;
Borghs, Gustaaf
Journal
Journal of Vacuum Science and Technology B
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1846
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Acq. date: 2025-12-16
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Metrics
Views
1846
since deposited on 2021-10-17
3
last month
1
last week
Acq. date: 2025-12-16
Citations