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Sub-5nm electron beam lithography

dc.contributor.authorArjmandi, Nima
dc.contributor.authorStakenborg, Tim
dc.contributor.authorBorghs, Gustaaf
dc.contributor.authorLagae, Liesbet
dc.date.accessioned2021-10-17T21:18:04Z
dc.date.available2021-10-17T21:18:04Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14906
dc.sourceIIOimport
dc.titleSub-5nm electron beam lithography
dc.typeMeeting abstract
dc.contributor.imecauthorStakenborg, Tim
dc.contributor.imecauthorBorghs, Gustaaf
dc.contributor.imecauthorLagae, Liesbet
dc.contributor.orcidimecStakenborg, Tim::0000-0001-9878-9078
dc.source.peerreviewyes
dc.source.conference35th International Conference on Micro & Nano Engineering - MNE
dc.source.conferencedate28/09/2009
dc.source.conferencelocationGent Belgium
dc.identifier.urlhttp://www.mne09.org/
imec.availabilityPublished - imec


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