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Stress characterization of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser anneal

dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorFernandez Lanas, Tatiana
dc.contributor.authorRosseel, Erik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorDekkers, Harold
dc.contributor.authorEneman, Geert
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLoo, Roger
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-17T21:19:53Z
dc.date.available2021-10-17T21:19:53Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14944
dc.sourceIIOimport
dc.titleStress characterization of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser anneal
dc.typeProceedings paper
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.source.peerreviewno
dc.source.beginpage217
dc.source.endpage227
dc.source.conferenceULSI Process Characterization 6
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 25, issue 7


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