dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Laenens, Bart | |
dc.contributor.author | Verhaegen, Staf | |
dc.contributor.author | Van Look, Lieve | |
dc.contributor.author | Trivkovic, Darko | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Van Adrichem, Paul | |
dc.contributor.author | Socha, Robert | |
dc.contributor.author | Mulder, M. | |
dc.contributor.author | Baron, Stanislas | |
dc.contributor.author | Tsai, Min-Chun | |
dc.contributor.author | Ning, Kai | |
dc.contributor.author | Hsu, Stephen | |
dc.contributor.author | Bouma, A. | |
dc.contributor.author | van der Heijden, E. | |
dc.contributor.author | Schreel, Koen | |
dc.contributor.author | Carpaij, R. | |
dc.contributor.author | Dusa, Mircea | |
dc.contributor.author | Zimmerman, Joerg | |
dc.contributor.author | Graeupner, Paul | |
dc.contributor.author | Hennerkes, Christoph | |
dc.date.accessioned | 2021-10-17T21:21:24Z | |
dc.date.available | 2021-10-17T21:21:24Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14966 | |
dc.source | IIOimport | |
dc.title | Freeform illumination sources: Source mask optimization for 22 nm node SRAM | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | Van Look, Lieve | |
dc.contributor.imecauthor | Trivkovic, Darko | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Van Adrichem, Paul | |
dc.contributor.imecauthor | Dusa, Mircea | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | 6th International Symposium on Immersion Lithography Extensions | |
dc.source.conferencedate | 22/10/2009 | |
dc.source.conferencelocation | Prague Czech Republic | |
imec.availability | Published - open access | |
imec.internalnotes | e-proceedings Sematech-website | |