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dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVan Look, Lieve
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorSocha, Robert
dc.contributor.authorMulder, M.
dc.contributor.authorBaron, Stanislas
dc.contributor.authorTsai, Min-Chun
dc.contributor.authorNing, Kai
dc.contributor.authorHsu, Stephen
dc.contributor.authorBouma, A.
dc.contributor.authorvan der Heijden, E.
dc.contributor.authorSchreel, Koen
dc.contributor.authorCarpaij, R.
dc.contributor.authorDusa, Mircea
dc.contributor.authorZimmerman, Joerg
dc.contributor.authorGraeupner, Paul
dc.contributor.authorHennerkes, Christoph
dc.date.accessioned2021-10-17T21:21:24Z
dc.date.available2021-10-17T21:21:24Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14966
dc.sourceIIOimport
dc.titleFreeform illumination sources: Source mask optimization for 22 nm node SRAM
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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