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Investigation of EUV process sensitivities for wafer track processing

dc.contributor.authorBradon, Neil
dc.contributor.authorWeichert, Heiko
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorKitano, J.
dc.contributor.authorKosugi, H.
dc.contributor.authorYoshihara, K.
dc.contributor.authorGoethals, Mieke
dc.contributor.authorHermans, Jan
dc.date.accessioned2021-10-17T21:26:42Z
dc.date.available2021-10-17T21:26:42Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15028
dc.sourceIIOimport
dc.titleInvestigation of EUV process sensitivities for wafer track processing
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorHermans, Jan
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage727148
dc.source.conferenceAlternative Lithographic Technologies
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol.7271


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