Show simple item record

The influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials

dc.contributor.authorBraginsky, O.V.
dc.contributor.authorKovalev, A.S.
dc.contributor.authorLopaev, D.V.
dc.contributor.authorMalykhin, E.M.
dc.contributor.authorMankelevich, Y.A.
dc.contributor.authorRakhimova, T.V.
dc.contributor.authorRakhimov, A.T.
dc.contributor.authorVasilieva, A.N.
dc.contributor.authorZyryanov, S.M.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-17T21:27:28Z
dc.date.available2021-10-17T21:27:28Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15035
dc.sourceIIOimport
dc.titleThe influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.conference62nd Annual Gaseous Electronics Conference - GEC
dc.source.conferencedate20/10/2009
dc.source.conferencelocationSaratoga Springs, NY USA
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record