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Development of a reduced cleaning process for application in a spray processor

dc.contributor.authorSnee, Peter
dc.contributor.authorMouche, Laurent
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Marc
dc.contributor.authorSchmidt, Harald
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T15:27:56Z
dc.date.available2021-09-29T15:27:56Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1503
dc.sourceIIOimport
dc.titleDevelopment of a reduced cleaning process for application in a spray processor
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage149
dc.source.endpage52
dc.source.conferenceProceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate23/09/1996
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access


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