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Controlled III/V nanowire growth by selective-area vapour phase epitaxy

dc.contributor.authorCantoro, Mirco
dc.contributor.authorBrammertz, Guy
dc.contributor.authorRichard, Olivier
dc.contributor.authorClemente, Francesca
dc.contributor.authorLeys, Maarten
dc.contributor.authorDegroote, Stefan
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-17T21:30:37Z
dc.date.available2021-10-17T21:30:37Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15062
dc.sourceIIOimport
dc.titleControlled III/V nanowire growth by selective-area vapour phase epitaxy
dc.typeProceedings paper
dc.contributor.imecauthorBrammertz, Guy
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecBrammertz, Guy::0000-0003-1404-7339
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage309
dc.source.endpage329
dc.source.conferenceGraphene and Emerging Materials for Post-CMOS Applications
dc.source.conferencedate24/05/2009
dc.source.conferencelocationSan Francisco, CA USA
dc.identifier.urlhttp://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=ECSTF8000019000005000309000001&idtype=cvips&prog=normal
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; vol 19, issue 5


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