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Phase-shift photomask designed by scalar diffractiontheory

dc.contributor.authorCirino, Giuseppe
dc.contributor.authorMansano, Ronaldo
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorCescato, Lucila
dc.contributor.authorMarega, E.
dc.contributor.authorGoncalves Neto, Luiz
dc.date.accessioned2021-10-17T21:35:56Z
dc.date.available2021-10-17T21:35:56Z
dc.date.issued2009-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15100
dc.sourceIIOimport
dc.titlePhase-shift photomask designed by scalar diffractiontheory
dc.typeProceedings paper
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewyes
dc.source.beginpage487
dc.source.endpage497
dc.source.conference24th Symposium on Microelectronics Technology and Devices - SBMicro
dc.source.conferencedate31/08/2009
dc.source.conferencelocationNatal Brazil
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 23, issue 1


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