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Dry etch of bulk Si FinFET structures with tunable CD

dc.contributor.authorDevriendt, Katia
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-17T21:58:54Z
dc.date.available2021-10-17T21:58:54Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15237
dc.sourceIIOimport
dc.titleDry etch of bulk Si FinFET structures with tunable CD
dc.typeMeeting abstract
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conference2nd International Plasma Etch and Strip in Microelectronics Workshop - PESM
dc.source.conferencedate26/02/2009
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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