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Optimized HF solutions for ultra-clean Si surfaces

dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T15:30:57Z
dc.date.available2021-09-29T15:30:57Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1524
dc.sourceIIOimport
dc.titleOptimized HF solutions for ultra-clean Si surfaces
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage206
dc.source.endpage207
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate11/06/1996
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


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