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Polymer deep trench filling and patterning for Through Silicon Via technology

dc.contributor.authorDuval, Fabrice
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorSwinnen, Bart
dc.contributor.authorSoussan, Philippe
dc.date.accessioned2021-10-17T22:02:17Z
dc.date.available2021-10-17T22:02:17Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15255
dc.sourceIIOimport
dc.titlePolymer deep trench filling and patterning for Through Silicon Via technology
dc.typeProceedings paper
dc.contributor.imecauthorDuval, Fabrice
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorSwinnen, Bart
dc.contributor.imecauthorSoussan, Philippe
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.contributor.orcidimecSoussan, Philippe::0000-0002-1347-6978
dc.contributor.orcidimecSwinnen, Bart::0000-0002-6878-7124
dc.source.peerreviewno
dc.source.conference59th Electronics Components and Technology Conference - ECTC
dc.source.conferencedate26/05/2009
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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