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Cu deposition on Si surfaces from HF solutions in VLSI microfabrication

dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorMertens, Paul
dc.contributor.authorVos, Rita
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T15:31:15Z
dc.date.available2021-09-29T15:31:15Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1526
dc.sourceIIOimport
dc.titleCu deposition on Si surfaces from HF solutions in VLSI microfabrication
dc.typeOral presentation
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.conference3rd European Workshop on Electrochemical Processing of Semiconductors; November 6-8, 1996; Paris, France.
dc.source.conferencelocation
imec.availabilityPublished - imec


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