X-ray photoelectron diffraction study of thin Al2O3 films grown on Si(111) by molecular beam epitaxy
dc.contributor.author | El-Kazzi, Mario | |
dc.contributor.author | Grenet, Genevieve | |
dc.contributor.author | Merckling, Clement | |
dc.contributor.author | Saint-Girons, Guillaume | |
dc.contributor.author | Botella, Claude | |
dc.contributor.author | Marty, Olivier | |
dc.contributor.author | Hollinger, Guy | |
dc.date.accessioned | 2021-10-17T22:05:32Z | |
dc.date.available | 2021-10-17T22:05:32Z | |
dc.date.issued | 2009 | |
dc.identifier.issn | 1098-0121 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15271 | |
dc.source | IIOimport | |
dc.title | X-ray photoelectron diffraction study of thin Al2O3 films grown on Si(111) by molecular beam epitaxy | |
dc.type | Journal article | |
dc.contributor.imecauthor | Merckling, Clement | |
dc.contributor.orcidimec | Merckling, Clement::0000-0003-3084-2543 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 195312 | |
dc.source.journal | Physical Review B | |
dc.source.issue | 19 | |
dc.source.volume | 79 | |
imec.availability | Published - open access |