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Process compatibility of new advanced low-k dielectric

dc.contributor.authorFerchichi, Abdelkarim
dc.contributor.authorVanstreels, Kris
dc.contributor.authorHeylen, Nancy
dc.contributor.authorBeyer, Gerald
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorAsakuma, S.
dc.contributor.authorNakajima, M.
dc.date.accessioned2021-10-17T22:12:16Z
dc.date.available2021-10-17T22:12:16Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15302
dc.sourceIIOimport
dc.titleProcess compatibility of new advanced low-k dielectric
dc.typeMeeting abstract
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.source.peerreviewno
dc.source.beginpage2158
dc.source.conference216th ECS Meeting
dc.source.conferencedate1/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - imec


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