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dc.contributor.authorFleischmann, Claudia
dc.contributor.authorSioncke, Sonja
dc.contributor.authorSchouteden, K.
dc.contributor.authorParedis, K.
dc.contributor.authorBeckhoff, B.
dc.contributor.authorMüller, M.
dc.contributor.authorKolbe, M.
dc.contributor.authorMeuris, Marc
dc.contributor.authorVan Haesendonck, C.
dc.contributor.authorTemst, K.
dc.contributor.authorVantomme, Andre
dc.date.accessioned2021-10-17T22:15:40Z
dc.date.available2021-10-17T22:15:40Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15318
dc.sourceIIOimport
dc.titleInvestigations of the surface chemical composition and atomic structure of ex-situ sulfur passivated Ge(100)
dc.typeProceedings paper
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorVantomme, Andre
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage421
dc.source.endpage432
dc.source.conferenceAnalytical Techniques for Semiconductor Materials and Process Characterization 6 - ALTECH
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 25, issue 3


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