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Advances and challenges in dual-tone development process optimization

dc.contributor.authorFonseca, Carlos
dc.contributor.authorSomervell, Mark
dc.contributor.authorScheer, Steven
dc.contributor.authorPrintz, Wallace
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorNiwa, Takafumi
dc.contributor.authorBernard, Sophie
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-17T22:16:21Z
dc.date.available2021-10-17T22:16:21Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15321
dc.sourceIIOimport
dc.titleAdvances and challenges in dual-tone development process optimization
dc.typeProceedings paper
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72740I
dc.source.conferenceOptical Microlithography XXII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol 7274


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