Interpretation of spectroscopic ellipsometry measurements of ultrathin dielectric layers on silicon: impact of accuracy of the silicon optical constants

dc.contributor.author	Tonova, Diana
dc.contributor.author	Depas, Michel
dc.contributor.author	Vanhellemont, Jan
dc.date.accessioned	2021-09-29T15:32:50Z
dc.date.available	2021-09-29T15:32:50Z
dc.date.issued	1996
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/1536
dc.source	IIOimport
dc.title	Interpretation of spectroscopic ellipsometry measurements of ultrathin dielectric layers on silicon: impact of accuracy of the silicon optical constants
dc.type	Journal article
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	64
dc.source.endpage	68
dc.source.journal	Thin Solid Films
dc.source.volume	288
imec.availability	Published - open access