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Understanding the potential and limitations of the HfAlO as interpoly dielectric in floating gate flash memory

dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorDegraeve, Robin
dc.contributor.authorZahid, Mohammed
dc.contributor.authorNyns, Laura
dc.contributor.authorCho, Moon Ju
dc.contributor.authorKaczer, Ben
dc.contributor.authorJurczak, Gosia
dc.contributor.authorKittl, Jorge
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-17T22:30:49Z
dc.date.available2021-10-17T22:30:49Z
dc.date.issued2009
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15384
dc.sourceIIOimport
dc.titleUnderstanding the potential and limitations of the HfAlO as interpoly dielectric in floating gate flash memory
dc.typeJournal article
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1807
dc.source.endpage1811
dc.source.journalMicroelectronic Engineering
dc.source.issue7_9
dc.source.volume86
imec.availabilityPublished - open access
imec.internalnotesINFOS 2009


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