Publication:

Effect of PAG distribution on ArF and EUV resist performance

Date

2009
Journal article
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18422.pdf 446.68 KB

Author(s)

Gronheid, Roel  
;
Rathsack, Benjamin
;
Bernard, Sophie
;
Vaglio Pret, Alessandro  
;
Nafus, Kathleen  
;
Hatakeyama, Shinichi

Journal

Journal of Photopolymer Science and Technology

Abstract

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