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Effect of PAG distribution on ArF and EUV resist performance

dc.contributor.authorGronheid, Roel
dc.contributor.authorRathsack, Benjamin
dc.contributor.authorBernard, Sophie
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHatakeyama, Shinichi
dc.date.accessioned2021-10-17T22:35:20Z
dc.date.available2021-10-17T22:35:20Z
dc.date.issued2009
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15403
dc.sourceIIOimport
dc.titleEffect of PAG distribution on ArF and EUV resist performance
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorNafus, Kathleen
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage97
dc.source.endpage104
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue1_6
dc.source.volume22
imec.availabilityPublished - open access


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