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Use of surface haze for evaluation of photoresist residue removal efficiency

dc.contributor.authorHalder, Sandip
dc.contributor.authorVos, Rita
dc.contributor.authorWada, Masayuki
dc.contributor.authorKenis, Karine
dc.contributor.authorBearda, Twan
dc.contributor.authorRadovanovic, Sanda
dc.contributor.authorDighe, Prasanna
dc.contributor.authorLeunissen, Peter
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-17T22:40:03Z
dc.date.available2021-10-17T22:40:03Z
dc.date.issued2009
dc.identifier.issn0894-6507
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15423
dc.sourceIIOimport
dc.titleUse of surface haze for evaluation of photoresist residue removal efficiency
dc.typeJournal article
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage587
dc.source.endpage591
dc.source.journalIEEE Transactions on Semiconductor Manufacturing
dc.source.issue4
dc.source.volume22
imec.availabilityPublished - open access


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