Use of surface haze for evaluation of photoresist residue removal efficiency

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Authors

Halder, Sandip; Vos, Rita; Wada, Masayuki; Kenis, Karine; Bearda, Twan; Radovanovic, Sanda; Dighe, Prasanna; Leunissen, Peter; Mertens, Paul

ISSN

0894-6507

Issue

4

Journal

IEEE Transactions on Semiconductor Manufacturing

Volume

22

Title

Use of surface haze for evaluation of photoresist residue removal efficiency

Publication type

Journal article

Embargo date

9999-12-31

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