Publication:

Use of surface haze for evaluation of photoresist residue removal efficiency

Date

2009
Journal article
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-6314-2685
cris.virtual.orcid0000-0001-7116-7498
cris.virtual.orcid0000-0003-2610-3406
cris.virtualsource.department1fc7b9f7-9367-45d8-be12-90bcb20ebcbd
cris.virtualsource.departmente97c04b9-4d2d-4488-b89a-1fbc84127a87
cris.virtualsource.departmentf44fed8c-edfd-4564-84f1-58a59c0caf6c
cris.virtualsource.orcid1fc7b9f7-9367-45d8-be12-90bcb20ebcbd
cris.virtualsource.orcide97c04b9-4d2d-4488-b89a-1fbc84127a87
cris.virtualsource.orcidf44fed8c-edfd-4564-84f1-58a59c0caf6c
dc.contributor.authorHalder, Sandip
dc.contributor.authorVos, Rita
dc.contributor.authorWada, Masayuki
dc.contributor.authorKenis, Karine
dc.contributor.authorBearda, Twan
dc.contributor.authorRadovanovic, Sanda
dc.contributor.authorDighe, Prasanna
dc.contributor.authorLeunissen, Peter
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2021-10-17T22:40:03Z
dc.date.available2021-10-17T22:40:03Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.issn0894-6507
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15423
dc.source.beginpage587
dc.source.endpage591
dc.source.issue4
dc.source.journalIEEE Transactions on Semiconductor Manufacturing
dc.source.volume22
dc.title

Use of surface haze for evaluation of photoresist residue removal efficiency

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
18542.pdf
Size:
1.65 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles