Publication:

Use of surface haze for evaluation of photoresist residue removal efficiency

Date

2009

Journal article

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Files

18542.pdf 1.65 MB

Author(s)

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Radovanovic, Sanda

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Dighe, Prasanna

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Leunissen, Peter

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Journal

IEEE Transactions on Semiconductor Manufacturing

Metrics

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Acq. date: 2025-12-13