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Use of surface haze for evaluation of photoresist residue removal efficiency
Publication:
Use of surface haze for evaluation of photoresist residue removal efficiency
Date
2009
Journal article
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18542.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Halder, Sandip
;
Vos, Rita
;
Wada, Masayuki
;
Kenis, Karine
;
Bearda, Twan
;
Radovanovic, Sanda
;
Dighe, Prasanna
;
Leunissen, Peter
;
Mertens, Paul
Journal
IEEE Transactions on Semiconductor Manufacturing
Abstract
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1936
since deposited on 2021-10-17
Acq. date: 2025-10-24
Citations
Metrics
Views
1936
since deposited on 2021-10-17
Acq. date: 2025-10-24
Citations