dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Fenger, Germain | |
dc.contributor.author | Lam, Michael | |
dc.contributor.author | Word, James | |
dc.date.accessioned | 2021-10-17T22:48:36Z | |
dc.date.available | 2021-10-17T22:48:36Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15456 | |
dc.source | IIOimport | |
dc.title | Experimental determination and accurate modeling of the EUV ADT flare | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | International Symposium on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | 18/10/2009 | |
dc.source.conferencelocation | Prague Czech Republic | |
imec.availability | Published - open access | |
imec.internalnotes | e-proceedings Sematech-website | |