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Accurate models for EUV lithography

dc.contributor.authorHendrickx, Eric
dc.contributor.authorLorusso, Gian
dc.contributor.authorJiang, Jiong
dc.contributor.authorChen, Luoqi
dc.contributor.authorLui, Wei
dc.contributor.authorVan Setten, Eelca
dc.contributor.authorHansen, Steve
dc.date.accessioned2021-10-17T22:48:51Z
dc.date.available2021-10-17T22:48:51Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15457
dc.sourceIIOimport
dc.titleAccurate models for EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLorusso, Gian
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage74882G
dc.source.conferencePhotomask Technology 2009
dc.source.conferencedate14/09/2009
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE vol. 7488


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