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Accurate models for EUV Lithography

dc.contributor.authorHendrickx, Eric
dc.contributor.authorLorusso, Gian
dc.contributor.authorVan Setten, Eelco
dc.contributor.authorHansen, Steve
dc.contributor.authorJiang, Jiong
dc.contributor.authorLiu, Wei
dc.contributor.authorChen, Luogi
dc.date.accessioned2021-10-17T22:49:06Z
dc.date.available2021-10-17T22:49:06Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15458
dc.sourceIIOimport
dc.titleAccurate models for EUV Lithography
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorLiu, Wei
dc.contributor.orcidimecLiu, Wei::0000-0002-6573-2881
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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