dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Baudemprez, Bart | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | van Dijk, Andre | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Goethals, Mieke | |
dc.date.accessioned | 2021-10-17T22:50:59Z | |
dc.date.available | 2021-10-17T22:50:59Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15466 | |
dc.source | IIOimport | |
dc.title | Stability and imaging of the ASML EUV Alpha Demo Tool | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.imecauthor | Baudemprez, Bart | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | van Dijk, Andre | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 72710T | |
dc.source.conference | Alternative Lithographic Technologies | |
dc.source.conferencedate | 22/02/2009 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol.7271 | |