dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Loo, Roger | |
dc.contributor.author | Witters, Liesbeth | |
dc.contributor.author | Takeoka, Shinji | |
dc.contributor.author | Geypen, Jef | |
dc.contributor.author | Brijs, Bert | |
dc.contributor.author | Merckling, Clement | |
dc.contributor.author | Caymax, Matty | |
dc.contributor.author | Dekoster, Johan | |
dc.date.accessioned | 2021-10-17T22:55:10Z | |
dc.date.available | 2021-10-17T22:55:10Z | |
dc.date.issued | 2009-10 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15479 | |
dc.source | IIOimport | |
dc.title | SiGe SEG growth for buried channel p-MOS devices | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.imecauthor | Witters, Liesbeth | |
dc.contributor.imecauthor | Geypen, Jef | |
dc.contributor.imecauthor | Merckling, Clement | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.imecauthor | Dekoster, Johan | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.contributor.orcidimec | Merckling, Clement::0000-0003-3084-2543 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 201 | |
dc.source.endpage | 210 | |
dc.source.conference | ULSI Process Integration 6 | |
dc.source.conferencedate | 4/10/2009 | |
dc.source.conferencelocation | Vienna Austria | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 25, issue 7 | |