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A CDU comparison of double-patterning process options using Monte Carlo simulation

dc.contributor.authorHooge, Joshua
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorScheer, Steven
dc.contributor.authorFoubert, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorLeray, Philippe
dc.date.accessioned2021-10-17T22:56:56Z
dc.date.available2021-10-17T22:56:56Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15486
dc.sourceIIOimport
dc.titleA CDU comparison of double-patterning process options using Monte Carlo simulation
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorLeray, Philippe
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72741U
dc.source.conferenceOptical Microlithography XXII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol 7274


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