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Validation of CD-SEM etching residue evaluation technique for MuGFET structures

dc.contributor.authorIsawa, Miki
dc.contributor.authorTanaka, Maki
dc.contributor.authorMaeda, Tatsuya
dc.contributor.authorWatanabe, Kenji
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorCollaert, Nadine
dc.contributor.authorRooyackers, Rita
dc.date.accessioned2021-10-17T23:07:17Z
dc.date.available2021-10-17T23:07:17Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15525
dc.sourceIIOimport
dc.titleValidation of CD-SEM etching residue evaluation technique for MuGFET structures
dc.typeProceedings paper
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72720Q
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXIII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7272


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