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Reactive ion etching of Pt and Pt-Metal stacks, for mems applications using the DSE systems at Imec

dc.contributor.authorJamieson, Geraldine
dc.contributor.authorSeveri, Simone
dc.contributor.authorVan Hoof, Rita
dc.contributor.authorDu Bois, Bert
dc.contributor.authorHelin, Philippe
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-17T23:08:05Z
dc.date.available2021-10-17T23:08:05Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15528
dc.sourceIIOimport
dc.titleReactive ion etching of Pt and Pt-Metal stacks, for mems applications using the DSE systems at Imec
dc.typeMeeting abstract
dc.contributor.imecauthorJamieson, Geraldine
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorVan Hoof, Rita
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorHelin, Philippe
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecJamieson, Geraldine::0000-0002-6750-097X
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference2nd International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate26/02/2009
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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