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EUV mask pattern correction

dc.contributor.authorJonckheere, Rik
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-17T23:12:57Z
dc.date.available2021-10-17T23:12:57Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15546
dc.sourceIIOimport
dc.titleEUV mask pattern correction
dc.typeOral presentation
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XVI
dc.source.conferencedate8/04/2009
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - open access
imec.internalnotesIMEC contribution to PMJ09 panel


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