dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Hendrickx, Eric | |
dc.date.accessioned | 2021-10-17T23:12:57Z | |
dc.date.available | 2021-10-17T23:12:57Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15546 | |
dc.source | IIOimport | |
dc.title | EUV mask pattern correction | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | Photomask and Next-Generation Lithography Mask Technology XVI | |
dc.source.conferencedate | 8/04/2009 | |
dc.source.conferencelocation | Yokohama Japan | |
imec.availability | Published - open access | |
imec.internalnotes | IMEC contribution to PMJ09 panel | |