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Processing impact on the reliability of single metal dual dielectric (SMDD) gate stacks

dc.contributor.authorKauerauf, Thomas
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorCho, Moon Ju
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorSchram, Tom
dc.contributor.authorDegraeve, Robin
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorBiesemans, Serge
dc.date.accessioned2021-10-17T23:20:28Z
dc.date.available2021-10-17T23:20:28Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15573
dc.sourceIIOimport
dc.titleProcessing impact on the reliability of single metal dual dielectric (SMDD) gate stacks
dc.typeProceedings paper
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage373
dc.source.endpage375
dc.source.conference47th Annual IEEE International Reliability Physics Symposium - IRPS
dc.source.conferencedate26/04/2009
dc.source.conferencelocationMontreal Canada
imec.availabilityPublished - open access


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