Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
dc.contributor.author | Kempsell, Monica | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Tritchkov, Alexander | |
dc.contributor.author | Sakajiri, Kyohei | |
dc.contributor.author | Yasui, Kenichi | |
dc.contributor.author | Yoshitake, Susuki | |
dc.contributor.author | Granik, Yuri | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Smith, Bruce W. | |
dc.date.accessioned | 2021-10-17T23:23:29Z | |
dc.date.available | 2021-10-17T23:23:29Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15584 | |
dc.source | IIOimport | |
dc.title | Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture | |
dc.type | Journal article | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 43001 | |
dc.source.journal | Journal of Micro/Nanolithography, MEMS, and MOEMS | |
dc.source.issue | 4 | |
dc.source.volume | 8 | |
imec.availability | Published - open access |