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Influence of UV irradiation on the removal of post-etch photoresist in porous low-k dielectric patterning
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Authors
Kesters, Els
;
Le, Quoc Toan
;
Lux, Marcel
;
Onandia, Laura
;
Baerts, Christina
;
Vereecke, Guy
Conference
216th ECS Meeting
Title
Influence of UV irradiation on the removal of post-etch photoresist in porous low-k dielectric patterning
Publication type
Meeting abstract
Embargo date
9999-12-31
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