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Investigation of physical cleaning process window by atomic force microscope

dc.contributor.authorKim, Tae-Gon
dc.contributor.authorWostyn, Kurt
dc.contributor.authorBearda, Twan
dc.contributor.authorPark, J.-G.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-17T23:27:11Z
dc.date.available2021-10-17T23:27:11Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15597
dc.sourceIIOimport
dc.titleInvestigation of physical cleaning process window by atomic force microscope
dc.typeProceedings paper
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage203
dc.source.endpage210
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 25, issue 5


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