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Silicon tip formation by isotropic SF6/HBr based dry etching

dc.contributor.authorKunnen, Eddy
dc.contributor.authorSeveri, Simone
dc.contributor.authorVerheyen, Peter
dc.contributor.authorDupont, Tania
dc.contributor.authorVan Hoof, Rita
dc.contributor.authorVleugels, Frank
dc.contributor.authorHeck, J.
dc.contributor.authorBelov, N.
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-17T23:38:14Z
dc.date.available2021-10-17T23:38:14Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15632
dc.sourceIIOimport
dc.titleSilicon tip formation by isotropic SF6/HBr based dry etching
dc.typeMeeting abstract
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorDupont, Tania
dc.contributor.imecauthorVan Hoof, Rita
dc.contributor.imecauthorVleugels, Frank
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference2nd International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate26/02/2009
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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