dc.contributor.author | Laidler, David | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Cheng, Shaunee | |
dc.contributor.author | Doytcheva, Maya | |
dc.contributor.author | Tenner, Manfred | |
dc.contributor.author | van Haren, Richard | |
dc.date.accessioned | 2021-10-17T23:42:18Z | |
dc.date.available | 2021-10-17T23:42:18Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15646 | |
dc.source | IIOimport | |
dc.title | Characterisation of direct alignment for LFLE process | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Laidler, David | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | van Haren, Richard | |
dc.contributor.orcidimec | Laidler, David::0000-0003-4055-3366 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | 6th Internation Symposium on Immersion Lithography Extensions | |
dc.source.conferencedate | 22/10/2009 | |
dc.source.conferencelocation | Prague Czech Republic | |
imec.availability | Published - open access | |
imec.internalnotes | e-proceedings Sematech-website | |