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Characterisation of direct alignment for LFLE process

dc.contributor.authorLaidler, David
dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorDoytcheva, Maya
dc.contributor.authorTenner, Manfred
dc.contributor.authorvan Haren, Richard
dc.date.accessioned2021-10-17T23:42:18Z
dc.date.available2021-10-17T23:42:18Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15646
dc.sourceIIOimport
dc.titleCharacterisation of direct alignment for LFLE process
dc.typeProceedings paper
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorvan Haren, Richard
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference6th Internation Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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