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EUV resist contrast loss determination using interference lithography

dc.contributor.authorLangner, Andreas
dc.contributor.authorSolak, Harun H.
dc.contributor.authorAuzelyte, Vaida
dc.contributor.authorEkinci, Yasin
dc.contributor.authorDavid, Christian
dc.contributor.authorGobrecht, Jens
dc.contributor.authorGronheid, Roel
dc.contributor.authorvan Setten, Eelco
dc.contributor.authorvan Ingen Schenau, Koen
dc.contributor.authorFeenstra, Kees
dc.date.accessioned2021-10-17T23:43:43Z
dc.date.available2021-10-17T23:43:43Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15651
dc.sourceIIOimport
dc.titleEUV resist contrast loss determination using interference lithography
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech website


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