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Modification of photoresist by UV for post-etch wet strip applications

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorPrager, Lutz
dc.contributor.authorClaes, Martine
dc.contributor.authorLux, Marcel
dc.contributor.authorVereecke, Guy
dc.date.accessioned2021-10-17T23:50:50Z
dc.date.available2021-10-17T23:50:50Z
dc.date.issued2009
dc.identifier.issn1662-9779
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15677
dc.sourceIIOimport
dc.titleModification of photoresist by UV for post-etch wet strip applications
dc.typeJournal article
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewyes
dc.source.beginpage323
dc.source.endpage326
dc.source.journalSolid State Phenomena
dc.source.volume145-146
imec.availabilityPublished - imec
imec.internalnotesUCPSS IX (2008)


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