Authors

Le, Quoc Toan; Kesters, Els; Prager, Lutz; Lux, Marcel; Marsik, Premysl; Vereecke, Guy

Conference

Materials, Processes and Reliability for Advanced Interconnects for Micro and Nanoelectronics

Title

Application of UV irradiation in removal of post-etch 193 nm photoresist

Publication type

Proceedings paper