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Overlay metrology for double patterning processes

dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorLaidler, David
dc.contributor.authorKandel, Daniel
dc.contributor.authorAdel, Mike
dc.contributor.authorDinu, Berta
dc.contributor.authorPolli, Marco
dc.contributor.authorVasconi, Mauri
dc.contributor.authorSalski, Bartlomiej
dc.date.accessioned2021-10-17T23:57:32Z
dc.date.available2021-10-17T23:57:32Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15700
dc.sourceIIOimport
dc.titleOverlay metrology for double patterning processes
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72720G
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.7272


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