Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows
dc.contributor.author | Lucas, Kevin | |
dc.contributor.author | Cork, Christopher M. | |
dc.contributor.author | Miloslavsky, Alexander | |
dc.contributor.author | Luk-Pat, Gerard | |
dc.contributor.author | Barnes, Levi D. | |
dc.contributor.author | Hapli, John | |
dc.contributor.author | Lewellen, John | |
dc.contributor.author | Rollins, Gregoy | |
dc.contributor.author | Wiaux, Vincent | |
dc.contributor.author | Verhaegen, Staf | |
dc.date.accessioned | 2021-10-18T00:16:49Z | |
dc.date.available | 2021-10-18T00:16:49Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15763 | |
dc.source | IIOimport | |
dc.title | Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows | |
dc.type | Journal article | |
dc.contributor.imecauthor | Wiaux, Vincent | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 33002 | |
dc.source.journal | Journal of Micro/Nanolithography, MEMS, and MOEMS | |
dc.source.issue | 3 | |
dc.source.volume | 8 | |
imec.availability | Published - open access |