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Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows

dc.contributor.authorLucas, Kevin
dc.contributor.authorCork, Christopher M.
dc.contributor.authorMiloslavsky, Alexander
dc.contributor.authorLuk-Pat, Gerard
dc.contributor.authorBarnes, Levi D.
dc.contributor.authorHapli, John
dc.contributor.authorLewellen, John
dc.contributor.authorRollins, Gregoy
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVerhaegen, Staf
dc.date.accessioned2021-10-18T00:16:49Z
dc.date.available2021-10-18T00:16:49Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15763
dc.sourceIIOimport
dc.titleDouble-patterning interactions with wafer processing, optical proximity correction, and physical design flows
dc.typeJournal article
dc.contributor.imecauthorWiaux, Vincent
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage33002
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.issue3
dc.source.volume8
imec.availabilityPublished - open access


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