Filling of microvia with an aspect ratio of 5 by copper electrodeposition
dc.contributor.author | Luhn, Ole | |
dc.contributor.author | Van Hoof, Chris | |
dc.contributor.author | Ruythooren, Wouter | |
dc.contributor.author | Celis, Jean-Pierre | |
dc.date.accessioned | 2021-10-18T00:18:21Z | |
dc.date.available | 2021-10-18T00:18:21Z | |
dc.date.issued | 2009 | |
dc.identifier.issn | 0013-4686 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15768 | |
dc.source | IIOimport | |
dc.title | Filling of microvia with an aspect ratio of 5 by copper electrodeposition | |
dc.type | Journal article | |
dc.contributor.imecauthor | Van Hoof, Chris | |
dc.contributor.imecauthor | Ruythooren, Wouter | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 2504 | |
dc.source.endpage | 2508 | |
dc.source.journal | Electrochimica Acta | |
dc.source.issue | 9 | |
dc.source.volume | 54 | |
imec.availability | Published - open access |