dc.contributor.author | Malinowski, Pawel | |
dc.contributor.author | John, Joachim | |
dc.contributor.author | Lorenz, Anne | |
dc.contributor.author | Cheng, Kai | |
dc.contributor.author | Derluyn, Joff | |
dc.contributor.author | Germain, Marianne | |
dc.contributor.author | De Moor, Piet | |
dc.contributor.author | Minoglou, Kiki | |
dc.contributor.author | Barkusky, Frank | |
dc.contributor.author | Bayer, Armin | |
dc.contributor.author | Mann, Klaus | |
dc.contributor.author | Duboz, Jean-Yves | |
dc.contributor.author | Semond, Fabrice | |
dc.contributor.author | Hochedez, Jean-Francois | |
dc.contributor.author | Giordanengo, Boris | |
dc.contributor.author | Borghs, Gustaaf | |
dc.contributor.author | Mertens, Robert | |
dc.date.accessioned | 2021-10-18T00:26:48Z | |
dc.date.available | 2021-10-18T00:26:48Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15794 | |
dc.source | IIOimport | |
dc.title | Radiation hardness of Al(x)Ga(1-x)N photodetectors exposed to Extreme UltraViolet (EUV) light beam | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Malinowski, Pawel | |
dc.contributor.imecauthor | John, Joachim | |
dc.contributor.imecauthor | De Moor, Piet | |
dc.contributor.imecauthor | Borghs, Gustaaf | |
dc.contributor.imecauthor | Mertens, Robert | |
dc.contributor.orcidimec | Malinowski, Pawel::0000-0002-2934-470X | |
dc.source.peerreview | no | |
dc.source.conference | European Optics & Optoelectronics Symposium | |
dc.source.conferencedate | 20/04/2009 | |
dc.source.conferencelocation | Prague Czech Republic | |
imec.availability | Published - imec | |