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Sensor wafers in modern plasma etching technology

dc.contributor.authorMilenin, Alexey
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBoullart, Werner
dc.contributor.authorArleo, Paul
dc.date.accessioned2021-10-18T00:47:52Z
dc.date.available2021-10-18T00:47:52Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15860
dc.sourceIIOimport
dc.titleSensor wafers in modern plasma etching technology
dc.typeMeeting abstract
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference2nd International Plasma Etch and Strip in Microelectronics Workshop - PESM
dc.source.conferencedate26/02/2009
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttp://www.pesm2009.be/
imec.availabilityPublished - open access


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